GLOBALFOUNDRIES Outlines Plans for EUV Lithography Leadership
In a keynote address today at SEMICON West, Gregg Bartlett, senior vice president of technology and R&D at GLOBALFOUNDRIES, revealed details of the companys plans to drive Extreme Ultraviolet (EUV) lithography to high-volume production.
Our strategy is to move past the pre-production tool step and straight to purchasing a production-level tool for installation in Fab 8our new leading-edge fab currently under construction in upstate New York, Bartlett said. We are planning to install this tool in the second half of 2012 so we can immediately begin the development work to enable volume production by the 2014/2015 timeframe. It is our collaborative approach to R&D that has put us in a position to make such a movea move that will accelerate the charge to volume production for the entire industry.
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